Instrument Description
Type:
E-beam Evaporation
Make:
Temescal
Model:
BJD-2000
Manufacturer URL:
Temescal BJD-2000 E-beam Evaporator
Temescal BJD-2000 E-beam Evaporator
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75 (Cleanroom)
Temescal BJD-2000 E-beam Evaporator
The Temescal BJD-2000 E-beam Evaporator instrument is used for the deposition of dielectric thin films.
Capabilities/Specifications
- Six pocket, single e-beam source with available source materials of aluminum oxide, indium tin oxide, silicon dioxide, titanium dioxide
- In-situ crystal deposition monitor
- Rotating standard planetary holds maximum of 13 substrates up to 3 inch in diameter
- Variable-angle planetary holds one, 3 inch diameter wafer and can be used for glancing-angle deposition
- Oxygen ion source
- Substrate heater with maximum temperature of 300°C
- Base pressure of chamber is 10-7 Torr