Instrument Description
Type:
Photolithography
Make:
OAI
Model:
350W
Manufacturer URL:
OAI UV Flood Exposure
OAI UV Flood Exposure
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)
OAI UV Flood Exposure
The OAI UV Flood Exposure instrument is used to provide a uniform beam of UV light for photolithography processing.
Capabilities/Specifications
- Located in class 100 lab space
- 365 nm UV exposure source
- 5-inch diameter exposure area