Instrument Description
Type:
Photolithography
Make:
Suss
Model:
MA6
Manufacturer URL:
Suss Microtech MA6 Mask Aligner
Suss Microtech MA6 Mask Aligner
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)
Suss Microtech MA6 Mask Aligner
The Suss Microtech MA6 Mask Aligner instrument is used for patterning photosensitive polymers with UV light.
Capabilities/Specifications
- Located in class 100 lab space
- Front side or back side alignment capable
- 320 nm UV exposure source
- Contact, vacuum contact or proximity modes
- Supports sample sizes between 10×10 mm die to 4 inch diameter wafer
- Mask holders with 2 to 4 inch diameter pattern area - Masks are research project specific and are not supplied by the SRF. A test mask is available for process development.