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Instrument Description

Type:
Photolithography
Make:
Suss
Model:
MA6

Usage Info

Availability:
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes

Location

Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)

Suss Microtech MA6 Mask Aligner

The Suss Microtech MA6 Mask Aligner instrument is used for patterning photosensitive polymers with UV light.

Capabilities/Specifications

  • Located in class 100 lab space
  • Front side or back side alignment capable
  • 320 nm UV exposure source
  • Contact, vacuum contact or proximity modes
  • Supports sample sizes between 10×10 mm die to 4 inch diameter wafer
  • Mask holders with 2 to 4 inch diameter pattern area - Masks are research project specific and are not supplied by the SRF.  A test mask is available for process development.

Contact

Harley Hart

Trieu Nguyen

(916) 532-4710

Trieu.nguyen@mail.wvu.edu

ESB G60 | WH 409