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Instrument Description

Type:
Photolithography
Make:
Suss
Model:
MJB3
Manufacturer URL:
Suss MJB3 Mask Aligner

Usage Info

Availability:
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes

Location

Campus:
Downtown
College:
Eberly College of Arts and Sciences
Department:
WVU SRF
Address:
White Hall 410 (Cleanroom)

Suss MJB3 Mask Aligner

The Suss MJB3 Mask Aligner is used for patterning photosensitive polymers with UV light.

Capabilities/Specifications

  • Located in class 1,000 lab space
  • Front side alignment only
  • 365 nm UV exposure source
  • Contact, vacuum contact, or proximity modes
  • Supports sample sizes between 10×10 mm die to 3 inch diameter wafer
  • Supports masks with 2 inch diameter pattern area - Masks are research project specific and are not supplied by the SRF.  A test mask is available for process development.

Contact

Harley Hart

Trieu Nguyen

(916) 532-4710

Trieu.nguyen@mail.wvu.edu

ESB G60 | WH 409