Instrument Description
Type:
Photolithography
Make:
Suss
Model:
MJB3
Manufacturer URL:
Suss MJB3 Mask Aligner
Suss MJB3 Mask Aligner
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Downtown
College:
Eberly College of Arts and Sciences
Department:
WVU SRF
Address:
White Hall 410 (Cleanroom)
Suss MJB3 Mask Aligner
The Suss MJB3 Mask Aligner is used for patterning photosensitive polymers with UV light.
Capabilities/Specifications
- Located in class 1,000 lab space
- Front side alignment only
- 365 nm UV exposure source
- Contact, vacuum contact, or proximity modes
- Supports sample sizes between 10×10 mm die to 3 inch diameter wafer
- Supports masks with 2 inch diameter pattern area - Masks are research project specific and are not supplied by the SRF. A test mask is available for process development.