Instrument Description
Type:
Deposition
Make:
Neocera
Model:
PLD/PED
Manufacturer URL:
Neocera PLD/PED
Neocera PLD/PED
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Downtown
College:
Eberly College of Arts and Sciences
Department:
WVU SRF
Address:
White Hall 410A (Cleanroom)
Neocera PLD/PED
The Neocera PLD/PED/Sputtering instrument is a multipurpose system for the deposition of thin films using PLD, PED, and sputtering techniques
Capabilities/Specifications
- Computer controlled UHV system with loadlock for high throughput
- Laser MBE system with STAIB Instruments RHEED set-up
- Laser is a Coherent Comprex Pro with a wavelength of 248nm
- Configured with PLD-CCS (Continuous Composition Spread)
- PED (Pulsed Electron Deposition) source can be installed upon request
- System can be configured with up to 6 – 1 in. targets or 3 – 2 in. targets. Note:: Targets are provided by the user and must be approved by SRF staff.
- Rotatable substrate holder with a maximum sample size of 2 in.
- Source gases are argon, oxygen and nitrogen
- Backside substrate heater with a maximum temperature of 1050°C
- Capable of Rf and DC sputtering through the use of 2 – 2 in. sputter guns