Instrument Description
Type:
Etching
Make:
Trion
Model:
Minilock III
Manufacturer URL:
Trion Technologies Minilock III RIE with ICP
Trion Technologies Minilock III RIE with ICP
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)
Trion Technologies Minilock III RIE with ICP
The Trion Technologies Minilock III RIE with ICP is used for anisotropic and isotropic plasma etching of semiconductors, insulators, metals and polymers.
Capabilities/Specifications
- Computer controlled loadlock instrument
- Maximum substrate wafer size of 4 inch
- Samples smaller than 4 inch are attached to 4 inch carrier wafer using Cool Grease or AZ5214 photoresist
- Cathode is an electrostatic chuck with backside helium cooling
- 600 W RIE power supply and 1200 W ICP power supply
- Base pressure of chamber is 1x10-3 Torr