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Instrument Description

Type:
Etching
Make:
Trion
Model:
Minilock III

Usage Info

Availability:
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes

Location

Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)

Trion Technologies Minilock III RIE with ICP

The Trion Technologies Minilock III RIE with ICP is used for anisotropic and isotropic plasma etching of semiconductors, insulators, metals and polymers.

Capabilities/Specifications

  • Computer controlled loadlock instrument
  • Maximum substrate wafer size of 4 inch
  • Samples smaller than 4 inch are attached to 4 inch carrier wafer using Cool Grease or AZ5214 photoresist
  • Cathode is an electrostatic chuck with backside helium cooling
  • 600 W RIE power supply and 1200 W ICP power supply
  • Base pressure of chamber is 1x10-3 Torr

Contact

Harley Hart

Trieu Nguyen

(916) 532-4710

Trieu.nguyen@mail.wvu.edu

ESB G60 | WH 409