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Instrument Description

Type:
Photolithography
Make:
Laurell Technologies 400
Model:
Laurell Technologies 400

Usage Info

Availability:
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes

Location

Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)

Laurell Technologies 400 Spinner

The Laurell Technologies 400 spinners are used for applying uniform polymer films like photoresist or for spin cleaning with solvents.

Capabilities/Specifications

  • Located in class 100 lab space
  • Two spinners located in 4 foot spinner hood with hotplates available
  • For use with substrates from 10 mm to 6 inches
  • Maximum speed of 12,000 rpm
  • Photoresists available are AZ 5214E-IR, SU-8 2025, SU-8 2020. If a different photoresist is needed for a specific purpose, a Material Tracking Form must be submitted.  The photoresist must be approved by SRF staff prior to being stored in the cleanroom.

User Resources


Contact

Harley Hart

Trieu Nguyen

(916) 532-4710

Trieu.nguyen@mail.wvu.edu

ESB G60 | WH 409