Instrument Description
Type:
Photolithography
Make:
Laurell Technologies 400
Model:
Laurell Technologies 400
Manufacturer URL:
Laurell Technologies 400 Spinner
Laurell Technologies 400 Spinner
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)
Laurell Technologies 400 Spinner
The Laurell Technologies 400 spinners are used for applying uniform polymer films like photoresist or for spin cleaning with solvents.
Capabilities/Specifications
- Located in class 100 lab space
- Two spinners located in 4 foot spinner hood with hotplates available
- For use with substrates from 10 mm to 6 inches
- Maximum speed of 12,000 rpm
- Photoresists available are AZ 5214E-IR, SU-8 2025, SU-8 2020. If a different photoresist is needed for a specific purpose, a Material Tracking Form must be submitted. The photoresist must be approved by SRF staff prior to being stored in the cleanroom.