Instrument Description
Type:
Sputtering
Make:
CVC
Model:
610
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)
CVC Sputter Station 610
The CVC 610 DC Magnetron Sputtering Station is used for the deposition of metal and nitride thin films.
Capabilities/Specifications
- 8 inch target source with available targets of titanium and aluminum
- 2-inch interchangeable target source with available targets of aluminum, chrome, copper, gold, platinum, titanium, and tantalum Note: maximum coverage area of 2 inch target is 3 inch
- Maximum substrate size of 6 inch
- Rotating sun which holds up to 6 substrates
- Argon source gas
- Capable of nitrogen-assisted argon deposition for reactive sputtering depositions
- Ion cleaning source
- Backside substrate heater up to 300°C
- Base pressure of chamber is 10-6 Torr