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Instrument Description

Type:
Sputtering
Make:
CVC
Model:
610

Usage Info

Availability:
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes

Location

Campus:
Evansdale
College:
Benjamin M. Statler College of Engineering and Mineral Resources
Department:
WVU SRF
Address:
Engineering Sciences Building G75B (Cleanroom)

CVC Sputter Station 610

The CVC 610 DC Magnetron Sputtering Station is used for the deposition of metal and nitride thin films.

Capabilities/Specifications

  • 8 inch target source with available targets of titanium and aluminum
  • 2-inch interchangeable target source with available targets of aluminum, chrome, copper, gold, platinum, titanium, and tantalum Note: maximum coverage area of 2 inch target is 3 inch
  • Maximum substrate size of 6 inch
  • Rotating sun which holds up to 6 substrates
  • Argon source gas
  • Capable of nitrogen-assisted argon deposition for reactive sputtering depositions
  • Ion cleaning source
  • Backside substrate heater up to 300°C
  • Base pressure of chamber is 10-6 Torr

Contact

Harley Hart

Trieu Nguyen

(916) 532-4710

Trieu.nguyen@mail.wvu.edu

ESB G60 | WH 409