Instrument Description
Type:
Sputtering
Make:
DC and Rf Sputtering Station
Usage Info
Availability:
Internal and external researchers
Internal and external researchers
Training Requirements:
Request training via iLab.
*Safety related prerequisite trainings may be required.
Request training via iLab.
*Safety related prerequisite trainings may be required.
SRA-approved rates:
Yes
Yes
Location
Campus:
Downtown
College:
Eberly College of Arts and Sciences
Department:
WVU SRF
Address:
White Hall 410A (Cleanroom)
DC and RF Sputtering Station
The DC and Rf Sputtering Station is located in WH 410A. The instrument is used for the deposition of thin metal and dielectric films.
Capabilities/Specifications
- Configured for DC and Rf Sputtering
- 5 - 2 inch AJA 320 sputter sources with available targets of aluminum, cobalt, chrome, copper, gold, nickel, platinum, tantalum ,titanium and zinc oxide - User targets specific to a project can be installed upon request
- Rotatable substrate holder with a maximum sample size of 3.5 inches
- Loadlock system is attached to chamber for high throughput
- Stanford Research System RGA 100 is installed for in-situ analysis
- Source gases are argon and oxygen
- Backside substrate heater with a maximum temperature of 850°C
- Base chamber of the chamber is 10-8 Torr